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Feijoo Guerro, Pedro Carlos pc.feijoo@upm.es

MATEMÁTICA APLICADA A LA INGENIERÍA INDUSTRIAL / Universidad Politécnica de Madrid

Publications

Nitridation of Si by N2 electron cyclotron resonance plasma and integration with ScOx deposition

  • Feijoo P
  • Del Prado A
  • Toledano-Luque M
  • San Andŕs E
  • Lucía M

Journal Of The Electrochemical Society - 26/3/2010

10.1149/1.3301726 View at source

  • ISSN 00134651

Scandium oxide deposited by high-pressure sputtering for memory devices: Physical and interfacial properties

  • Feijoo P
  • Del Prado A
  • Toledano-Luque M
  • San Andŕs E
  • Lucía M

Journal Of Applied Physics - 15/4/2010

10.1063/1.3354096 View at source

  • ISSN 00218979

Electrical characterization of high-pressure reactive sputtered ScO x films on silicon

  • LUIS BAILON
  • HELENA CASTAN
  • SALVADOR DUEÑAS
  • PEDRO CARLOS FEIJOO GUERRO
  • HECTOR GARCIA
  • ALFONSO GOMEZ
  • MARIA LUISA LUCIA MULAS
  • ALVARO DEL PRADO MILLAN
  • ENRIQUE SAN ANDRES SERRANO
  • MARIA TOLEDANO LUQUE
... View more Collapse

Thin Solid Films (p. 2268-2272) - 31/1/2011

10.1016/j.tsf.2010.10.073 View at source

  • ISSN 00406090

Anomalous thermal oxidation of gadolinium thin films deposited on silicon by high pressure sputtering

  • Pampillon, M. A.
  • Feijoo, P. C.
  • San Andres, E.
  • Lucia, M. L.
  • del Prado, A.
  • Toledano-Luque, M.;

Microelectronic Engineering (p. 2991-2996) - 1/9/2011

10.1016/j.mee.2011.04.058 View at source

  • ISSN 01679317

Optimization of scandium oxide growth by high pressure sputtering on silicon

  • Feijoo, P. C.
  • Pampillon, M. A.
  • San Andres, E.
  • Lucia, M. L.;

Thin Solid Films (p. 81-86) - 30/12/2012

10.1016/j.tsf.2012.11.008 View at source

  • ISSN 00406090

Time-dependent dielectric breakdown on subnanometer EOT nMOS FinFETs

  • Feijoo P
  • Kauerauf T
  • Toledano-Luque M
  • Togo M
  • San Andrés E
  • Groeseneken G

Ieee Transactions On Device And Materials Reliability (p. 166-170) - 1/3/2012

10.1109/tdmr.2011.2180387 View at source

  • ISSN 15304388

Interface quality of Sc2O3 and Gd2O3 films based metal-insulator-silicon structures using Al, Pt, and Ti gates: Effect of buffer layers and scavenging electrodes

  • Gomez, Alfonso
  • Castan, Helena
  • Garcia, Hector
  • Duenas, Salvador
  • Bailon, Luis
  • Angela Pampillon, Maria
  • Carlos Feijoo, Pedro
  • San Andres, Enrique;
... View more Collapse

Journal Of Vacuum Science And Technology B: Nanotechnology And Microelectronics - 1/1/2013

10.1116/1.4768678 View at source

  • ISSN 21662746

High pressure sputtering as a viable technique for future high permittivity dielectric on III-V integration: GdOx on InP demonstration

  • Angela Pampillon, Maria
  • Canadilla, Carmina
  • Carlos Feijoo, Pedro
  • San Andres, Enrique
  • del Prado, Alvaro;

Journal Of Vacuum Science And Technology B: Nanotechnology And Microelectronics - 1/1/2013

10.1116/1.4771970 View at source

  • ISSN 21662746

Optimization of in situ plasma oxidation of metallic gadolinium thin films deposited by high pressure sputtering on silicon

  • Angela Pampillon, Maria
  • Carlos Feijoo, Pedro
  • San Andres, Enrique
  • Luisa Lucia, Maria;

Journal Of Vacuum Science And Technology B: Nanotechnology And Microelectronics - 1/1/2013

10.1116/1.4769893 View at source

  • ISSN 21662746

Optimization of gadolinium oxide growth deposited on Si by high pressure sputtering

  • Carlos Feijoo, Pedro
  • Angela Pampillon, Maria
  • San Andres, Enrique;

Journal Of Vacuum Science And Technology B: Nanotechnology And Microelectronics - 1/1/2013

10.1116/1.4766184 View at source

  • ISSN 21662746

This researcher has no books.

This researcher has no book chapters.

Interface quality of Sc2O3 and Gd2O3 films based MIS structures using Al, Pt and Ti gate: effect of buffer layer and scavenging electrodes

  • LUIS A BAILON VEGA
  • HELENA CASTAN LANASPA
  • SALVADOR DUEÑAS CARAZO
  • PEDRO CARLOS FEIJOO GUERRO
  • HECTOR GARCIA GARCIA
  • ALFONSO GOMEZ BRAVO
  • MARIA ANGELA PAMPILLON ARCE
  • ENRIQUE SAN ANDRES SERRANO
... View more Collapse

25/6/2012

  • iMarina

Optimization of in situ plasma oxidation of Gd metallic thin films deposited by high pressure sputtering on Si

  • PEDRO CARLOS FEIJOO GUERRO
  • MARIA LUISA LUCIA MULAS
  • MARIA ANGELA PAMPILLON ARCE
  • ENRIQUE SAN ANDRES SERRANO

25/6/2012

  • iMarina

Gadolinium Scandate by High Pressure Sputtering as a High-k Dielectric

  • Feijoo, P. C.
  • Pampillon, M. A.
  • Andres, E. San;

Proceedings Of The 2013 Spanish Conference On Electron Devices (Cde 2013) (p. 17-20) - 1/1/2013

  • ISSN 21634971
  • iMarina

Electrical study of ScO-based MIS structures using Al and Ti as gate electrodes

  • Garcia, H.
  • Castan, H.
  • Duenas, S.
  • Bailon, L.
  • Feijoo, P. C.
  • Pampillon, M. A.
  • San Andres, E.;
... View more Collapse

Proceedings Of The 2013 Spanish Conference On Electron Devices (Cde 2013) (p. 285-288) - 1/1/2013

  • ISSN 21634971
  • iMarina

Plasma oxidation of metallic gadolinium deposited on silicon by high pressure sputtering as high permittivity dielectric

  • Pampillon, M. A.
  • Feijoo, P. C.
  • Andres, E. San
  • Fierro, J. L. G.;

Proceedings Of The 2013 Spanish Conference On Electron Devices (Cde 2013) (p. 5-8) - 1/1/2013

  • ISSN 21634971
  • iMarina

Towards high-k integration with III-V channels: interface optimization of high pressure sputtered gadolinium oxide on indium phospide

  • San Andres, E.
  • Pampillon, M. A.
  • Canadilla, C.
  • Feijoo, P. C.
  • del Prado, A.;

Proceedings Of The 2013 Spanish Conference On Electron Devices (Cde 2013) (p. 25-28) - 1/1/2013

  • ISSN 21634971
  • iMarina

Plasma oxidation of metallic gadolinium deposited on silicon by high pressure sputtering as high permittivity dielectric

  • PEDRO CARLOS FEIJOO GUERRO
  • JOSE LUIS GARCIA FIERRO
  • MARIA ANGELA PAMPILLON ARCE
  • ENRIQUE SAN ANDRES SERRANO

9th Spanish Conference On Electron Devices, Cde 2013 (p. 5-8) - 8/4/2013

10.1109/cde.2013.6481328 View at source

  • ISSN 9781467346689

Gadolinium scandate by high pressure sputtering as a high-k dielectric

  • PEDRO CARLOS FEIJOO GUERRO
  • MARIA ANGELA PAMPILLON ARCE
  • ENRIQUE SAN ANDRES SERRANO

9th Spanish Conference On Electron Devices, Cde 2013 (p. 17-20) - 8/4/2013

10.1109/cde.2013.6481331 View at source

  • ISSN 9781467346689

Electrical study of ScO-based MIS structures using Al and Ti as gate electrodes

  • LUIS A BAILON VEGA
  • HELENA CASTAN LANASPA
  • SALVADOR DUEÑAS CARAZO
  • PEDRO CARLOS FEIJOO GUERRO
  • HECTOR GARCIA GARCIA
  • MARIA ANGELA PAMPILLON ARCE
  • ENRIQUE SAN ANDRES SERRANO
... View more Collapse

9th Spanish Conference On Electron Devices, Cde 2013 (p. 285-288) - 8/4/2013

10.1109/cde.2013.6481398 View at source

  • ISSN 9781467346689

Towards high-k integration with III-V channels: Interface optimization of high pressure sputtered gadolinium oxide on indium phospide

  • CARMINA CAÑADILLA SOTO
  • PEDRO CARLOS FEIJOO GUERRO
  • MARIA ANGELA PAMPILLON ARCE
  • ALVARO DEL PRADO MILLAN
  • ENRIQUE SAN ANDRES SERRANO

9th Spanish Conference On Electron Devices, Cde 2013 (p. 25-28) - 8/4/2013

10.1109/cde.2013.6481333 View at source

  • ISSN 9781467346689

This researcher has no working papers.

This researcher has no technical reports.

Nueva generación de dieléctricos de alta permitividad para su aplicación en la puerta de transistores de utilidad en radiofrecuencia

  • Ignacio Mártil de la Plaza (Investigador principal (IP))
  • FEIJOO GUERRO, PEDRO CARLOS (Investigador/a)

Period: 01-01-2007 - 31-12-2010

  • iMarina

Medida a temperatura variable de estructuras de puerta de transistores con dieléctricos de alta permitividad

  • Germán González Díaz (Investigador principal (IP))
  • FEIJOO GUERRO, PEDRO CARLOS (Investigador/a)

Period: 01-01-2008 - 31-12-2008

  • iMarina

Fabricación de dispositivos de efecto campo con dieléctrico de alta permitividad sobre Si y semiconductores III-V para el nodo de 22 nm

  • ENRIQUE SAN ANDRES SERRANO (Investigador principal (IP))
  • FEIJOO GUERRO, PEDRO CARLOS (Investigador/a)

Period: 01-01-2011 - 31-12-2013

Type of funding: National

Amount of funding: 213444,00 Euros.

  • iMarina

Dispositivos electrónicos de baja dimensionalidad para aplicaciones de radiofrecuencia y digitales: simulación y desarrollo de software

  • Xavier Oriols (Investigador principal (IP))
  • FEIJOO GUERRO, PEDRO CARLOS (Investigador/a)

Period: 01-01-2013 - 31-12-2015

Type of funding: National

Amount of funding: 123201,00 Euros.

  • iMarina

Graphene-Based Revolutions in ICT And Beyond

  • David Jiménez Jiménez (Investigador principal (IP))
  • FEIJOO GUERRO, PEDRO CARLOS (Investigador/a)

Period: 01-10-2013 - 31-12-2015

Amount of funding: 475618,00 Euros.

  • iMarina

Grup de Recerca Consolidat

  • Xavier Aymerich (Investigador principal (IP))
  • FEIJOO GUERRO, PEDRO CARLOS (Investigador/a)

Period: 01-01-2014 - 31-12-2018

Amount of funding: 30000,00 Euros.

  • iMarina

Transporte de electrones y fonones en nanodispositivos para aplicaciones de bajo y cero consumo (ELEPHONT)

  • Xavier Cartoixà Soler
  • Xavier Oriols Pladevall (Investigador principal (IP))
  • FEIJOO GUERRO, PEDRO CARLOS (Investigador/a)

Period: 01-01-2016 - 31-12-2018

Type of funding: National

Amount of funding: 116900,00 Euros.

  • iMarina

Graphene-based disruptive technologies (Grephane Core 1)

  • David Jiménez Jiménez (Investigador principal (IP))
  • FEIJOO GUERRO, PEDRO CARLOS (Investigador/a)

Period: 01-01-2016 - 31-12-2018

Amount of funding: 490000,00 Euros.

  • iMarina

Graphene-Based Disruptive Technologies (Graphene Core 2)

  • David Jiménez Jiménez (Investigador principal (IP))
  • FEIJOO GUERRO, PEDRO CARLOS (Investigador/a)

Period: 01-04-2018 - 31-03-2020

Amount of funding: 400000,00 Euros.

  • iMarina

RIS3CAT – Comunitats Emergents

  • David Jiménez Jiménez (Investigador principal (IP))
  • FEIJOO GUERRO, PEDRO CARLOS (Investigador/a)

Period: 01-06-2018 - 30-06-2021

Amount of funding: 175000,00 Euros.

  • iMarina

This researcher has no supervised thesis.

This researcher has no patents or software licenses.

Last data update: 3/5/24 7:21 PM