Use of nanoindentation to characterise the plasma damage region in low-k dielectric films - J M Molina-Aldareguia; M R Elizalde; IOcaña; J Gil-Sevillano; JM Martínez-Esnaola; FIacopi; Y Travaly; M Van Hove (American Society Of Mechanical Engineers, Applied Mechanics Division, Amd, 2006)